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TSMC shares deep-dive details about its cutting edge 2nm process node at IEDM 2024 — 35 percent less power or 15 percent more performance
the first metal layer (M1) is now created in one EUV exposure pass followed by a single etch step (1P1E), reducing complexity, lowering mask counts, and improving overall process efficiency. TSMC ...
Design-Reuse10y
TSMC and Synopsys Extend Custom Design Collaboration into 16-nm
Along with support for the TSMC 16-nm ... display and interactive FinFET rule checking. Laker's built-in double-pattern checking has been enhanced to support pre-coloring and color density checking.
Design-Reuse9y
TSMC Certifies Cadence Innovus Implementation System on 16-nanometer FinFET Plus Process
TSMC and Cadence are actively collaborating to certify the Innovus Implementation System on the TSMC 10nm FinFET process SAN JOSE, Calif., 08 Jun 2015 -- Cadence Design Systems, Inc. (NASDAQ: CDNS) ...
Computing4y
TSMC to begin 3nm mass production in 2021, report
But, during an investors meeting in April, TSMC CEO Dr. Che-Chia Wei said that the firm will continue using FinFET transistor structure for 3nm process technology. Wei also stated that TSMC's N5 ...